Initial application

There are three (3) forms which need to be completed: 

1) The application
The application for the Polish pension must be sent to the Office of Veterans and Victims of Oppression (known by the Polish acronym “UdSKiOR”) and can be found here.
An annotated guide is available here.
Please note:

  1. The narrative on page 4 must be written in Polish. A draft in English or another language may be sent to us and one of our professional translators will render it into Polish for you.
  2. The application must be accompanied by evidence of the applicant’s oppression during the war. You can see a list of resources for finding information here, and we can also assist in research.

2) Release form
This form authorizes Polish Pension Help (PPH) to make inquiries with UdSKiOR and ZUS (the national social insurance institution of Poland, which sends out the payment once it is approved) on behalf of the applicant. The form is available here and must also be stamped and signed by a notary public.
Please note
: Although this form is entitled “power of attorney,” it is not like the usual power of attorney where the principal appoints an agent to take control of his or her affairs. This form only gives PPH the permission to make inquiries about issues regarding his or her Polish pension. The name of the director of PPH is pre-populated on the form.

3) Proxy form
Since UdSKiOR does not mail any correspondence outside of Poland, a proxy with Poland is necessary to receive all mail regarding the Polish pension and then send it abroad to the applicant. The Auschwitz Jewish Center (AJC), a museum in Oświęcim, Poland, has kindly accepted this role at no cost. The proxy form must therefore be sent to AJC to notify them that the applicant wishes the institution to be appointed as his or her proxy. The form can be found here.
Please note: The form can be sent to AJC by mail, email or fax as per the instructions on the bottom of the form. Alternatively, the form can be emailed to us and we can forward it to AJC on behalf of the applicant.

Updated October 13, 2024